Advantest Corporation unveiled the E5620 Defect Review Scanning Electron Microscope its newest mask SEM product for reviewing and classifying ultra-small defects on photomasks and mask blanks. With its high-accuracy, high-throughput defect review capability, the E5620 DR-SEM is expected to contribute appreciably to production quality improvements in next-generation photomasks and shorter mask manufacturing turnaround times. Like its predecessor, the E5620 implements Advantest's highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations.

The system has a number of improvements specifically to target future mask requirements. E5620 Key New Features, HigSpatatial Resolution, Highly Stable, Fully Automatic Image Capture, mpatible with Mask Inspection n Systems, Elemental Composition Analysis Option, Backscattered Electron Analysis Option, T E5620 0 DR-SEM is available for purchase now. Advantest will share further details regarding its new E5620 DR-SEM during SEMICON Japan 2022, December 14-16, at Tokyo Big Sight.