Japan Display Inc. and Idemitsu Kosan Co. Ltd. have successfully co-developed an innovative poly-crystalline oxide semiconductor, Poly-OS, for use in a wide variety of displays, including wearable devices, smartphones, metaverse devices such as VR, Notebook PCs, and large-display TVs. By integrating Idemitsu Kosan's newly developed proprietary poly-crystalline oxide semiconductor material and JDI's proprietary backplane2 technology, the new Poly-OS semiconductor contributes significantly to improving display performance by achieving both high mobility and low off-leak current3 on Gen 6 mass production lines.

Poly-OS can also be deployed to large-size Gen 8 lines and above, significantly reducing display manufacturing costs. Both JDI and Idemitsu Kosan are committed to actively promoting this innovative technology globally. Idemitsu Kosan started the development of a poly-crystalline oxide semiconductor material IGO (Indium Gallium Oxide) for flat panel displays as part of its electronic materials business in 2006.

IGO has high mobility equivalent to low temperature polysilicon (LTPS)4, which could not be achieved with existing oxide semiconductors, along with stable thin- film transistor (TFT)5 characteristics that can be applied to Gen 8 and larger substrate lines. Both JDI and Idemitsu Kosan are supporting the ongoing development of Poly-OS technology so that it can be widely applied in diverse applications across the global display industry. JDI and Idemitsu Kosan are committed to contributing to a low-carbon society through display performance improvements, the evolution of the global display industry, and lower display power consumption.