Lasertec Corporation announced the release of ACTIS A300 series Actinic EUV Patterned Mask Inspection System for High-NA. ACTIS A150 actinic EUV patterned mask inspection system provided by Lasertec has been facilitating the adoption of EUV lithography to high-volume manufacturing. It is renowned for its excellent inspection performance in the industry.

The newly released ACTIS A300 is a next-generation model that meets the requirements of manufacturing processes using high-NA EUV lithography to enable the further miniaturization of device geometries. The A300 series uses newly designed optics and high-brightness light source URASHIMA . It achieves a significant improvement in defect detection performance compared to the A150 series.

The anamorphic optics used in high-NA lithography have adopted different magnifications of projection in the X and Y directions. Inspection of EUV masks for high-NA lithography, therefore, requires different levels of resolution in the two directions. The A300 series can also be used to inspect EUV masks for the current NA lithography as well as EUV masks for high-NA lithography.

Lasertec is dedicated to supporting the needs of leading-edge semiconductor manufacturers, developing unique solutions, and facilitating quality and productivity improvement, thereby contributing to the advancement of the industry. Features: Inspection of EUV masks for high-NA lithography. Inspection of EUV masks for the current NA lithography.

High productivity inspection with highly efficient optics and high-brightness light source URASHIMA. Applications: Quality assurance inspection during EUV mask manufacturing processes. Incoming EUV mask inspection and periodic quality assurance inspection at wafer fabs.