Park Systems announced Park NX-Mask, the most effective, safe, and efficient new generation photomask repair equipment. Park NX-Mask offers optimized solutions that support dual pods for handling EUV masks on inline production. It provides all in one solution--from auto defect review to repair of defects and verification of the repair--accelerating the throughput at unprecedented repair efficacy.

Park NX-Mask repairs even the most challenging photomasks by removing defects and foreign particles with nanometer accuracy and angstrom level precision of the edge-placement. It does this without disturbing the reflective surface pattern and spurious depositions including stains and implanted elements. The automatic defect review comes standard in Park NX-Mask, a feature handy for EUV mask reticles, for high throughput, high resolution and free from destructive risks posed by other methods including e-beam and laser.

Furthermore, Park NX-Mask offers a fully automated AFM nano-metrology for surface roughness and pattern step height. It does this with sub-angstrom vertical precision in non-contact scanning mode.