PARK SYSTEMS CORP. Park Systems Corp. introduced its newest product, the Park NX-IR R300, a nanoscale infrared spectroscopy (IR) system for industrial applications. Park NX-IR R300 is an infrared spectroscopy and atomic force microscopy integrated into one, for up to 300 mm semiconductor wafers.
It provides chemical property information as well as mechanical and topographical data for semiconductor research, failure analysis and defect characterization at an unprecedent high nano resolution. Park NX-IR R300 combines the most advanced IR spectroscopy of photo-induced force microscopy (PIFM) onto the industry leading Park NX20 300 mm AFM platform. The PIFM spectroscopy provides chemical identification under 10 nm spatial resolution.
It uses a non-contact technique that offers damage-free spectroscopy probing, higher resolution and accuracy throughout scans. Furthermore, the Park PIFM provides the user with spectroscopy information at varying depths, offering invaluable insight into sample composition.
